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Seminar: Wednesday, Oct. 12, 2011 at 3:30pm

Beyond the Rayleigh limit in optical lithography
Dr. M. Suhail Zubairy
Texas A&M University
Institute for Quantum Studies and Department of Physics and Astronomy

It is well known that the classical schemes for microscopy and lithography are restricted by the diffraction limit. The precision with which a pattern could be etched in interference lithography is limited by the wavelength of the light. In recent years, a number of schemes have been proposed via quantum interferometry to improve the resolution. Some of these schemes are based on quantum entanglement and multiphoton processes. In this talk we shall discuss several schemes for 'quantum' lithography using classical light.

Location: Physics Bldg., Room 401